(Read now) Diazonaphthoquinone-based Resists (Tutorial Texts in Optical Engineering)
♥ Ralph Dammel ♥
| #2931273 in Books | SPIE Publications | 1993-02-15 | Original language:English | PDF # 1 | 10.25 x7.25 x.50l,1.03 | File Name: 0819410195 | 203 pages |
||0 of 0 people found the following review helpful.| I bought this not-so-easy to find book, and it ...|By Andrei K. Dioumaev|I bought this not-so-easy to find book, and it arrived exactly as promised ... BTW very cheaply!
This book elucidates the reasons underlying the lasting success of DNQ/N resist systems by examining the correlation between the chemical structure of the components and the photoresist performance. The basic chemistries of both DNQ sensitizers and novolak resins are explored. Focus also is placed on the chemical basis of application-related facets of the lithographic process. Methods of increasing process performance, such as image reversal, top layer imaging, antirefl...
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You easily download any file type for your gadget.Diazonaphthoquinone-based Resists (Tutorial Texts in Optical Engineering) | Ralph Dammel. I have read it a couple of times and even shared with my family members. Really good. Couldnt put it down.
